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View (S)TEM JEOL 2200 FSTransmission electron microscopyJEOL 2200 FS
View 4pointes_ligne_02Electrical characterization0n042A(inv)
View 4pointes_ligne_formationElectrical characterization0n079A(inv)
View Advanced_Vacuum_RIEDry etchingAdvanced_Vacuum320
View AET_RTAThermal processesAET0
View AFM Park_NX10Atomic force microscopyParkNX10
View Agilent_5500ls_Pico_PlusAtomic force microscopyAgilent5500ls_Pico_Plus
View Alcatel_Evap_BEL_310Metallic thin film depositionAlcatelEvap_BEL_310
View Alcatel_Evap_SCM_600Metallic thin film depositionAlcatelEvap_SCM_600
View ALD_Fiji_200Dielectric thin film deposition Cambridge_NanotechFiji_F200
View Alliance_Concept_AC450Metallic thin film depositionAlliance ConceptAC450
View ApSy_PECVD_Multiplex_V1Dielectric thin film deposition ApSyPECVD_Multiplex_V1
View Astemec_Sputter_W_formationMetallic thin film depositionAstemecSputter_formation
View Bruker_DI3100Atomic force microscopyBrukerDI3100
View Bruker_ICONAtomic force microscopyBrukerICON
View Buehler_Polishing_systemPolishingBuehler0
View CAIBEDry etchingC2NCAIBE
View CCP-RIE_STS_FormationDry etchingPlassys0
View cluster-tool UHV CBEEpitaxyHome madeHome made
View cluster-tool UHV CVDEpitaxyHome MadeHome Made
View Contact_anglePhysico-Chemical Characterization00
View CVD graphèneEpitaxyAixtronBlack Magic
View CVD_graphene_SiCEpitaxyQthermQtherm
View CVD_mat2DEpitaxyNaberthermNabertherm
View D224_S10_BackEnd_WetbenchWet process benchesAximabackEnd
View Denton_Co_Sputter_Explorer_14Metallic thin film depositionDentonCo_Sputter_Explorer_14
View Denton_Evap_UHVMetallic thin film depositionDentonEvap_UHV
View Diener_Descum_NanoDry etchingDienerNano
View Diener_Descum_PicoDry etchingDienerPico
View Disco_Dicing_saw_DAD641Back end / dicingDiscoDicing_saw_DAD641
View E1402_S01_Spin_CoatingFormation_lithoAximaSpin_Coat
View E1402_S02_Dvlpt_resist_opticFormation_lithoAximaDevelopment_Resists
View E1402_S03_Dvlpt_resist_electronic_solvantFormation_lithoAximaSolvant_Bench
View E1403_S01_Solvant_CleaningFormation_chimieAximaSolvant_Bench
View E1403_S02_Acid_HF_CleaningFormation_chimieAximaHF_Bench
View E1403_S03_Acid_Wet_EtchingFormation_chimieAximaAcid_Wet_Etch
View E15_S02_Heavy_Chemistry_Acid_WetbenchWet process benchesAximaAcid_Wetbench
View E161_S01_Fine_Chemistry_AcidEpitaxyAximawetbench
View E32_S01_Spin_EBL_HSQFocused beam lithographySussSpin_HSQ_only
View E32_S01_Spin_EBL_PMMAFocused beam lithographySussSpin_PMMA_Zep_CSAR
View E32_S02_Dvlpt_resist_ebl_solventFocused beam lithographyAximaDevelopment_ebl_resists_w_solvent
View E331_S01_Dvlpt_resistWet Benches0Dvlpt_resist
View E331_S02_Dvlpt_resistWet BenchesAximaDevelopment_resists_w_base
View E332_S01_Dvlpt_SU8_BCBWet BenchesAximaDvlpt_SU8_BCB
View E332_S02_recuit_lentWet BenchesAximarecuit_lent
View E333_S01_Cleaning_PrepWet Benches0Cleaning_Prep
View E333_S02_Spin_BCBWet BenchesAximaSolvent
View E333_S02_Spin_BCBWet BenchesAximaSpin_BCB
View E333_S03_Spin_Litho_UVWet BenchesSussLitho_UV
View E333_S04_Su8Wet BenchesAximaSu8
View E333_S05_Spin_HMDSWet BenchesAximaSU8
View E91_S01_Chem1_Metal_Wet_Etch_No_HFWet BenchesAximaMetal Wet etching no HF
View E91_S02_Chem1_Lift_OffWet BenchesAximaLift Off
View E91_S03_Chem1_III_V_comp _AcidWet BenchesAximaIII_V_Compatible_Acid
View E91_S04_Chem1_III_V_comp _Acid_HFWet BenchesAximaIII_V_Compatible_Acid_with_HF
View E91_S05_Chem1_III_V_comp _SolventWet BenchesAximaIII_V_Compatible_Solvent
View E91_S07_Chem1_III_V_comp _AcidWet BenchesAximaIII_V_Compatible_Solvent
View E92_S01_Chem2_ElectrochemistryWet BenchesAximaElectrochemistry
View E92_S02_Chem2_ElectrochemistryWet BenchesAximaElectrochemistry
View E92_S03_Chem2_ElectrochemistryWet BenchesAximaElectrochemistry
View E92_S04_Chem2_HF_Vapor_HFWet BenchesAximaHF_vapor_HF
View E92_S05_Chem2_KOH_TMAH_H3PO4Wet BenchesAximaKOH_TMAH_H3PO4
View E93_S01_Acid_WetbenchWet BenchesAximaAcid_Wetbench
View E93_S02_Solvent_WetbenchWet BenchesAximaSolvent_Wetbench
View E93_S03_Chem3_Si_comp _Acid_No_HFWet BenchesAximaSi_compatible_Acid_No_HF
View E93_S04_Chem3_Nanomaterials_SpinWet BenchesAximaNanomaterials and spin coater dedicated
View E93_S05_Chem3_Lift_OffWet BenchesAximaLift_Off
View E93_S06_Chem3_RemoversWet BenchesAximaRemovers_NMP_EBRPG
View Eberle_polymer_XL125Thermal processesEberleXL125
View Ecopia_Hall_EffectElectrical characterizationEcopian080A(inv)
View ESCIL_Polishing_system_300_GTLPolishingESCIL300_GTL
View EVG_ Double_Side_EVG620Optical lithographyEVGEVG620
View EVG_Bonder_EVG501Back end / direct bondingEVGBonder_EVG501
View EVG_DeepUV_EVG620Optical lithographyEVGEVG620
View EVG_Spray_Coater_EV101Optical lithographyEVGEV101
View FEI_SEM_Magellan_400LScanning electron microscopyFEISEM_Magellan_400L
View FEI_SEM_Verios_G4_HPScanning electron microscopyFEIVerios_G4_HP
View Fizeau_interferometerPhysico-Chemical CharacterizationFizeau0
View Fogale_C2N_M3DPhysico-Chemical CharacterizationFogale_Nanotech_C2NM3D
View Fogale_ZoomSurf_3DPhysico-Chemical CharacterizationFogale_NanotechZoomSurf_3D
View FSM_500_TCPhysico-Chemical CharacterizationFSM500_TC
View FTIR_Varian_Large_samplePhysico-Chemical CharacterizationVarian670_IR_Large_samples
View FTIR_Varian_small_samplePhysico-Chemical CharacterizationVArian670_IR_small_samples
View GILDEpitaxyHome madeHome made
View Hall_Effect_Magneto_resistanceElectrical characterization0n5057A(inv)
View Heidelberg_66_fsFocused beam lithographyHeidelbergDWL 66 fs
View Hitachi_SEM_S3600Scanning electron microscopyHitachiS3600
View Hitachi_SEM_S4800Scanning electron microscopyHitachiS4800
View Hitachi_SEM_SU8000Scanning electron microscopyHitachiSU8000
View Homemade_Bonder_AnodicBack end / direct bondingHomemade0
View Homemade_RTAThermal processesHomemadeRTA
View ICP Sentech SI500 FluorDry etchingSentechSi500
View Jandel_4pointes_ligne_01Electrical characterizationJandelln5055A(inv)
View Jandell_4pointes_carre_01Electrical characterizationJandelln5056A(inv)
View JFP_FlipChip_PP6Device mountingJFP_MICROTECHNICPP6
View JFP_Pick_and_Place_PP6Device mountingJFP_MICROTECHNICPP6
View JFP_Wirebonder_WB100Back end / wire bondingJFP MICROTECHNICWB100
View JFP_WireBonder_WB200Back end / wire bondingJFP MICROTECHNICWB100
View Jipelec_RTA_Jetfirst_100Thermal processesJipelecJetfirst100
View Jobin_Yvon_Ellipsometer_Uvisel2Physico-Chemical CharacterizationJobin_YvonUvisel2
View K&S_Wirebonder_4523Back end / wire bondingKulicke&Soffa4523
View Karlsuss_Scriber_InP_GaAsDevice mountingKarlsuusScriber_InP_GaAs
View M3D_Lareg_FieldPhysico-Chemical CharacterizationC2NM3D
View MBE 2DEGEpitaxyVeeco-RiberGenII
View MBE III-VEpitaxyRiberCompact21
View MBE Nanofils III-VEpitaxyRiberR32
View MBE NW nitruresEpitaxyRiberCompact12
View MBE spintroniqueEpitaxyRiberR2300
View MOVPEAlternative and emergent lithographyAixtronPegas
View MOVPE III-VEpitaxyEMCOREVEECO D180 TURBODISK REACTOR
View Nano_Imp_EVG620Alternative and emergent lithographyEVGEVG620
View Nanobeam_NB4Focused beam lithographyNanobeamNB4
View Nanonex_NR2500Alternative and emergent lithographyNanonexNR 2500
View Nanonex_Ultra100Alternative and emergent lithographyNanonexUltra 100
View Nanoplas_DescumDry etchingNanoplas0
View NanoscribeAlternative and emergent lithographyNanoscribe0
View Nextral_RIE_Fluorée1_NE100_63Dry etchingNextralNE_100_63
View Nextral_RIE_Fluorée2_NE100_73Dry etchingNextralNE100_73
View Nextral_RIE_SiCl4_NE100_56Dry etchingNextralNE100_56
View PANalytical XPert'M Pro MRDX-Ray DiffractionPANalyticalXPert Pro MRD DY1890
View PANalytical XPert'O Pro MRDX-Ray DiffractionPANalytical XPert Pro MRD DY1905
View Philips_SEM_XL30Scanning electron microscopyPhilipsXL_30
View PhotovoltaiquePlasma depositionC2NE1404
View Plasmos_SD2300Physico-Chemical CharacterizationPlasmosSD2300
View Plassys_Co_Evap_MEB_800Metallic thin film depositionPlassysCo_Evap_MEB_800
View Plassys_Evap_IAD_MEB_800Dielectric thin film deposition PlassysEvap_IAD_MEB_800
View Plassys_Evap_MEB_300S_formationMetallic thin film depositionPlassysEvap_MEB_300S_formation
View Plassys_Evap_MEB_400Metallic thin film depositionPlassysEvap_MEB_400
View Plassys_Evap_MEB_550SMetallic thin film depositionPlassysMEB_550S
View Plassys_Evap_MEB_550SLMetallic thin film depositionPlassysEvap_MEB_550SL
View Plassys_Evap_MEB_550SLXMetallic thin film depositionPlassysEvap_MEB_550SLX
View Plassys_Sputter_MP_700SMetallic thin film depositionPlassysSputter_MP_700S
View Plassys_Sputter_MP800Dielectric thin film deposition PlassysSputter_MP800
View PLD_oxydePlasma depositionHome MadeHome Made
View POEM_Cluster_XPSEpitaxyHome madeHome made
View Polishing_Metallo_200mmPolishingMetallo200mm
View Polishing_system_400mm²_P400PolishingOO
View PRESI_Polishing_Mecapol_P320_01PolishingPRESIMecapol_P320
View PRESI_Polishing_Mecapol_P320_02PolishingPRESIMecapol_P320
View Prober_MP25_IV_formationFormation_CaracterisationC2NE1405
View Prober_PM5Electrical characterizationAgilentPM5
View Prober_PM8Electrical characterizationProberPM8
View Prober_rond_CV_formationElectrical characterizationHomemaden5052a(inv)
View Prober_SOM4_IV_formationElectrical characterizationKarl_SussSOM4
View Raith_C2N_NanoFiB_150Focused Ion BeamRaith_C2NNanoFib_150
View Raith_EBPG_5000+Focused beam lithographyRaithEPBG5000+
View Raith_EBPG5200Focused beam lithographyRaithEBPG5200
View Raith150Focused beam lithographyRaithRaith150
View RIGAKU SmartlabX-Ray DiffractionRIGAKU SmartlabRIGAKU Smartlab
View Roth&Rau_IBE_01_SIMSDry etchingRoth&RauIBE_01_SIMS
View Roth&Rau_IBE_02Dry etchingRoth&RauIBE_02
View Sartorius_microbalancePhysico-Chemical CharacterizationSartorius059
View Sentech_400Physico-Chemical CharacterizationSentech400
View Sentech_ICP_Cl2_Si500Dry etchingSenetchSI500
View Sentech_ICP_Cl2_Si500SDry etchingSentechSi500S
View Sentech_RM2000Physico-Chemical CharacterizationSentechRM2000
View SOPRA_GES_5Physico-Chemical CharacterizationSOPRAGES_5
View Specac_presseAlternative and emergent lithographySpecacpresse
View Spray_developper_01Optical lithography*Spray developper 1
View Spray_developper_02Optical lithography*Sapr developper 2
View SPTS_ICP_Fluor_RapierDry etchingSPTSRapier
View SputteringPlasma depositionHome MadeHome Made
View Struers_Polishing_Labopol5PolishingStruersLabopol5
View STS_ICP_Cl2_SRDry etchingSTSSR
View STS_ICP_Fluor_Multiplex_HRMDry etchingSTSMultiplex HRM
View STS_RIE_Fluor_320PCDry etchingSTS320PC
View Suss_Bonder_SB6Back end / direct bondingSussBonder_SB6
View Suss_MA6Optical lithographySussMA6
View Suss_Microtec_Scriber_HR100Device mountingSuss_MicrotecHR100
View Suss_MJB3_01Optical lithographySussMjb3
View Suss_MJB3_02Optical lithographySussMjb3
View Suss_MJB4_01Optical lithographySussMjb4
View Suss_MJB4_02Optical lithographySussMjb4
View Tencor_alphastep_caracPhysico-Chemical CharacterizationTencorAlphastep
View Tencor_alphastep_lithoPhysico-Chemical CharacterizationTencorAlphastep
View Test toolMetrologyTestbolagetP
View Thermal_CameraPhysico-Chemical CharacterizationXX
View Unaxis_PECVD_ND200Dielectric thin film deposition UnaxisPECVD_ND200
View Veeco_Dektak08Physico-Chemical CharacterizationVeecoDektak08
View Veeco_Dektak08_formationPhysico-Chemical CharacterizationVeecoDektak08
View Vegatech_Tube_A1_Wet_OxydeThermal processesVegatechTube_A1_Wet_Oxyde
View Vegatech_Tube_A2_Dry_OxydeThermal processesVegatechTube_A2_Dry_Oxyde
View Vegatech_Tube_B1_DielectricThermal processesVegatechTube_B1_Dielectric
View Vegatech_Tube_B2_MetalThermal processesVegatechTube_B2_Metal
View Vinci_Co_Sputter_NbAlMetallic thin film depositionVinciVinci_Co_Sputter_Al
View Vinci_Co_Sputter_NbSiMetallic thin film depositionVinciCo_Sputter_NbSi
View Woolam_M2000XIPhysico-Chemical CharacterizationWoolamM2000XI
View Xactix_XeF2_Xetch_e1_seriesDry etchingXactixXetch_e1_series
View Zeiss_FIB_He_OrionFocused beam lithographyZeissFIB HE Orion
View Zeiss_SEM_LEO_1430Scanning electron microscopyZeissLEO_1430
View zzoutil_testDevice mountingpersonne2017
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