Picture of Nextral_RIE_Fluorée2_NE100_73
Current status:
AVAILABLE
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Responsibles
1st Responsible:
Laurence Ferlazzo
2nd Responsible:
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Description
Details
Tool name:
Nextral_RIE_Fluorée2_NE100_73
Area/room:
Attaque sèche/Gravure 4
Category:
Dry etching
Manufacturer:
Nextral
Model:
NE100_73
Process info

Materials allowed in this equipment :

Si, SiO2, Si3N4, not hardened resists (AZ, PMMA, ...)

Instructors & Licensed Users

Instructors

Licensed Users

Tool Modes
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