Pulsed Laser Deposition is a versatile technique to grow epitaxial thin films and multilayers of complex materials such as functional oxides. Our research tool allows to transfer matter from ceramic target to single crystalline substrate with a pulsed excimer laser (248 nm wavelength). Typical conditions are 600 - 700 °C sample temperature and 10-3 - 10-1 mbar O2 or N2O chamber pressure.
The equipment can deposit oxide materials on various substrates like SrTiO3, Scandates (DyScO3), Sapphire and Silicon.
Oxide materials routinely available in the PLD machine are :
- Perovskite oxides : Titanates including Pb(Zr,Ti)O3, Manganites (La,Sr)MnO3 and also SrRuO3, LaAlO3.
- Yttria - Stabilised - Zirconia (YSZ).
- Vanadium Oxide (VO2)