Picture of Nextral_RIE_SiCl4_NE100_56
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DOWN
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Responsibles
1st Responsible:
Laurence Ferlazzo
2nd Responsible:
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Description
Details
Tool name:
Nextral_RIE_SiCl4_NE100_56
Area/room:
Attaque sèche/Gravure 2 - Chloré
Category:
Dry etching
Manufacturer:
Nextral
Model:
NE100_56
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