Picture of E32_S02_Dvlpt_resist_ebl_solvent
Current status:
AVAILABLE
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Responsibles
1st Responsible:
Jean-René Coudevylle
2nd Responsible:
Edmond Cambril
Files
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Description
Details
Tool name:
E32_S02_Dvlpt_resist_ebl_solvent
Area/room:
[Not defined]
Category:
Focused beam lithography
Manufacturer:
Axima
Model:
Development_ebl_resists_w_solvent
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Instructors

Licensed Users

Tool Modes
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